Critical dimension of biperiodic gratings determined by spectral ellipsometry and Mueller matrix polarimetry
Critical dimension of biperiodic gratings determined by spectral ellipsometry and Mueller matrix polarimetry
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DOI：
10.1051/epjap:2008089
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发表时间：
2008-06
影响因子：
1
通讯作者：
M. Foldyna;A. Martino;E. García-Caurel;R. Ossikovski;C. Licitra;F. Bertin;K. Postava;B. Drévillon-B.-Drévill
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文献类型：
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作者：
M. Foldyna;A. Martino;E. García-Caurel;R. Ossikovski;C. Licitra;F. Bertin;K. Postava;B. Drévillon-B.-Drévill
我们通过椭圆偏振光谱仪（SE）和Mueller矩阵偏振仪（MMP）表征了两个由硅上具有方形孔阵列的光致抗蚀剂层组成的样品。孔的横向尺寸和深度通过拟合在常规的平面几何形状中获取的SE数据或在一般圆锥形衍射配置中获取的MMP数据来确定。提出了一种基于灵敏度和参数相关性客观确定最佳测量条件的方法。当应用于MMP时，该方法表明对于其中一个样品，最佳入射角为45°，远低于广泛使用的70°值。基于MMP的尺寸表征的鲁棒性通过在不同方位角处采集的数据的分离拟合所提供的结果的高稳定性来证明。
We characterized two samples consisting of photoresist layers on silicon with square arrays of square holes by spectroscopic ellipsometry (SE) and Mueller matrix polarimetry (MMP). Hole lateral dimensions and depths were determined by fitting either SE data taken in conventional planar geometry or MMP data in general conical diffraction configurations. A method for objective determination of the optimal measurement conditions based on sensitivity and parameter correlations is presented. When applied to MMP, this approach showed that for one of the samples the optimal incidence angle was 45°, much below the widely used 70° value. The robustness of the dimensional characterisation based on MMP is demonstrated by the high stability of the results provided by separated fits of the data taken at different azimuthal angles.