Spontaneous formation of discrete arrangement of particles by dipping ultraviolet/ozone-treated poly(dimethylsiloxane) substrate in solution
Spontaneous formation of discrete arrangement of particles by dipping ultraviolet/ozone-treated poly(dimethylsiloxane) substrate in solution
复制标题
通过将紫外线/臭氧处理的聚（二甲基硅氧烷）基材浸入溶液中自发形成离散排列的颗粒
DOI：
10.1002/app.43506
复制
发表时间：
2016
影响因子：
3
通讯作者：
Toshihiro Nishino
中科院分区：
文献类型：
--
作者：
Masashi Watanabe;Toshihiro Nishino
有序微结构的自发形成是一个有趣的研究课题，因为这种形成有助于低成本地生产功能材料。在这篇文章中，我们报告了一种新的方法，使用紫外线/臭氧处理的聚二甲基硅氧烷底物自发形成离散的颗粒排列。首先将基材浸泡在充满溶剂蒸汽的密封容器中的溶液(溶剂：甲醇和水的混合物，溶质：蔗糖或高氯酸锂)中，然后在空气中干燥，使溶质沉淀成颗粒。尽管该方法简单，但颗粒呈规则离散的三角形晶格排列，相邻颗粒之间的距离约为48µm，通过考虑溶液对基片表面的溶胀和溶液表面液膜的脱湿形成规则的韧窝，解释了阵列的形成机理。©2016威利期刊公司J.应用。波兰姆。科学，2016,133,43506。
The spontaneous formation of well‐ordered microstructures is an interesting research topic because such formation is useful for cost‐effective production of functional materials. In this article, we report a novel method for spontaneous formation of a discrete arrangement of particles using an ultraviolet/ozone‐treated poly(dimethylsiloxane) substrate. The substrate was first dipped in a solution (solvent: mixture of methanol and water, solute: sucrose or lithium perchlorate) in a sealed vessel filled with the vapor of the solvent, and was then dried in air to precipitate the solute as particles. In spite of the simplicity of the procedure, the particles were regularly and discretely arranged in a triangular lattice with a distance between the neighboring particles of about 48 µm. The mechanism of formation of the array was explained by considering the formation of regular dimples due to swelling of the substrate surface with the solution and the dewetting of the liquid film of the solution on the surface. © 2016 Wiley Periodicals, Inc. J. Appl. Polym. Sci.2016,133, 43506.