Fabrication of a Two-Dimensional Diffraction Grating with Isolated Photoresist Pattern Structures
Fabrication of a Two-Dimensional Diffraction Grating with Isolated Photoresist Pattern Structures
复制标题
DOI：
10.20965/ijat.2020.p0546
复制
发表时间：
2020-07
期刊：
影响因子：
--
通讯作者：
H. Matsukuma;Masanori Matsunaga;Kai Zhang;Y. Shimizu;W. Gao
中科院分区：
文献类型：
--
作者：
H. Matsukuma;Masanori Matsunaga;Kai Zhang;Y. Shimizu;W. Gao
提出了一种利用光刻胶隔离结构制作二维衍射光栅的方法，以减小光栅热膨胀引起的光栅间距波动。首先，对利用隔离光刻胶图形结构制作二维衍射光栅进行了理论计算，估算了曝光时间和显影时间对图形曝光和显影过程中图形结构的影响。设计了一个基于二极管激光器的紧凑型非正交双轴Lloyd镜干涉仪系统，尺寸为500 mm × 840 mm，用于稳定的无掩模干涉光刻。新开发的紧凑型干涉仪系统的基本性能进行了评估，通过制造的二维衍射光栅，以证明理论计算和开发的光刻系统的可行性。
This paper presents a fabrication method of a two-dimensional (2D) diffraction grating with isolated photoresist pattern structures in order to reduce fluctuation in the grating pitch due to the thermal expansion. At first, theoretical calculations for the fabrication of a 2D diffraction grating with isolated photoresist pattern structures are carried out to estimate the influences of exposure and development time on the pattern structures to be fabricated through the pattern exposure and development process. A diode laser-based compact non-orthogonal two-axis Lloyd’s mirror interferometer system designed in a size of 500 mm × 840 mm is then built on a breadboard for stable mask-less interference lithography. Basic performances of the newly developed compact interferometer system are evaluated through the fabrication of 2D diffraction gratings to demonstrate the feasibility of the theoretical calculations and the developed lithography system.