Optimization of wavefront-coded infinity-corrected microscope systems with extended depth of field.
Optimization of wavefront-coded infinity-corrected microscope systems with extended depth of field.
复制标题
DOI：
10.1364/boe.4.001464
复制
发表时间：
2013-08
影响因子：
3.4
通讯作者：
T. Zhao;T. Mauger;Guoqiang Li
中科院分区：
文献类型：
--
作者：
T. Zhao;T. Mauger;Guoqiang Li
通过在物镜和显像管透镜之间简单地应用一个特殊设计的位相掩模，无限远校正显微镜系统的景深大大扩展。与修改目标结构的方法相比，它更具成本效益，并为系统的装配提供了更好的灵活性。针对以往研究的重点是采用理想的光学系统进行模拟，本文设计了一种实用的波前编码无限远校正显微镜系统，并考虑了各种像差。基于商用光学设计软件，提出了分别采用非对称位相模板和对称位相模板设计波前编码显微镜的两种新的优化方法。我们分别使用多项式相位掩码和有理相位掩码作为非对称和对称相位掩码的例子。仿真结果表明，对于数值孔径为0.6的32×无穷大校正显微镜系统，两种优化方法都能取得较好的效果。景深扩展到传统景深的13倍左右。
The depth of field of an infinity-corrected microscope system is greatly extended by simply applying a specially designed phase mask between the objective and the tube lens. In comparison with the method of modifying the structure of objective, it is more cost effective and provides improved flexibility for assembling the system. Instead of using an ideal optical system for simulation which was the focus of the previous research, a practical wavefront-coded infinity-corrected microscope system is designed in this paper by considering the various aberrations. Two new optimization methods, based on the commercial optical design software, are proposed to design a wavefront-coded microscope using a non-symmetric phase mask and a symmetric phase mask, respectively. We use polynomial phase mask and rational phase mask as examples of the non-symmetric and symmetric phase masks respectively. Simulation results show that both optimization methods work well for a 32 × infinity-corrected microscope system with 0.6 numerical aperture. The depth of field is extended to about 13 times of the traditional one.