Nanofabrication with a helium ion microscope
Nanofabrication with a helium ion microscope
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DOI:
10.1117/12.862438
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发表时间:
2010-03
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影响因子:
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通讯作者:
D. Maas;E. van Veldhoven;Ping Chen;V. Sidorkin;H. Salemink;E. van der Drift;P. Alkemade
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文献类型:
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作者:
D. Maas;E. van Veldhoven;Ping Chen;V. Sidorkin;H. Salemink;E. van der Drift;P. Alkemade
The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well as a mechanism for very precise nanofabrication. The low proximity effects, due to the low yield of backscattered ions and the confinement of the forward scattered ions into a narrow cone, enable patterning of ultra-dense sub-10 nm structures. This paper presents various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion beam induced deposition.