Si nanoparticles fabricated from Si swarf by photochemical method

Si nanoparticles fabricated from Si swarf by photochemical method
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光化学法以硅屑为原料制备硅纳米颗粒

DOI:
10.1007/s11051-013-2240-y
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发表时间:
2014
期刊:
J. Nanopart. Res.
影响因子:
--
通讯作者:
H. Kobayashi
H. Kobayashi
中科院分区:
--
文献类型:
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作者:
T. Matsumoto;M. Maeda;J. Furukawa;W-.B. Kim;H. Kobayashi

文献摘要

相似文献

硅纳米颗粒是从硅屑中生产出来的,硅屑是在切割硅锭生产太阳能电池用硅片时产生的废料。珠磨法从硅屑中生产出几十纳米宽的片状硅。随后在0.5%的HF溶液中,用波长大于560 nm的光进行光化学溶解,得到直径1-7 nm的球形硅纳米颗粒。分散在乙醇中的硅纳米粒子在紫外光照射下在~400 nm(3.1 eV)处表现出蓝色光致发光,表明量子限域效应导致禁带变宽。由光致发光光谱估算出大多数硅纳米粒子的禁带能为2.5-3.3 eV,对应于硅纳米粒子的尺寸为1.9-3.2 eV。另一方面,在黑暗中浸泡在HF溶液中得到的硅纳米颗粒显示出弱得多的蓝色光致发光。这些结果表明光生空穴极大地促进了硅的溶解反应。
Si nanoparticles are produced from Si swarf which is a waste during slicing Si ingots to produce Si wafers for solar cell use. The beads mill method produces flake-like Si with scores of nanometers width from Si swarf. Subsequent photochemical dissolution with light longer than 560 nm wavelength in a 0.5 % HF solution results in sphere-shaped Si nanoparticles of 1–7 nm diameter. Si nanoparticles dispersed in ethanol show blue photoluminescence at ~400 nm (3.1 eV) under UV irradiation, indicating band-gap widening due to the quantum confinement effect. The band-gap energy of most of the Si nanoparticles is estimated to be 2.5–3.3 eV from the PL spectra, corresponding to the Si nanoparticle size of 1.9–3.2 nm. On the other hand, Si nanoparticles produced by immersion in the HF solution in the dark show much weaker blue photoluminescence. These results demonstrate that the Si dissolution reaction is greatly enhanced by photo-generated holes.