Properties of (Ti,Al,Si)N coatings for high demanding metal cutting applications deposited by HPPMS in an industrial coating unit
Properties of (Ti,Al,Si)N coatings for high demanding metal cutting applications deposited by HPPMS in an industrial coating unit
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HPPMS 在工业涂层装置中沉积的 (Ti,Al,Si)N 涂层的特性，适用于高要求的金属切削应用
DOI：
10.1002/ppap.200930408
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发表时间：
2009
影响因子：
3.5
通讯作者：
R. Cremer
中科院分区：
文献类型：
--
作者：
K. Bobzin;N. Bagcivan;P. Immich;S. Bolz;H. Fuß;R. Cremer
具有高抗氧化性和热稳定性的坚硬光滑涂层可用于经济加工。在这方面，nc-（Ti，Al）N/a-Si 3 N4薄膜通过使用工业CC 800/9高功率脉冲磁控溅射（HPPMS）镀膜装置在碳化钨切削刀片和WC/Co样品上溅射。通过扫描电子显微镜（EDS）和纳米压痕仪研究了涂层的组成和力学性能。对于约9.6原子%的硅含量，硬度为约36 GPa。进行光学发射光谱（OES）以检测沉积物质的电离分数并将其与直流（dc）进行比较。与直流溅射涂层相比，HPPMS涂层在与靶正交定位的区域上的沉积速率高1.6倍。最后，在苛刻条件下车削高速钢（高速钢）时，将切削性能与最先进的涂层进行了比较。在切削试验后，在切削刀片的后刀面侧拍摄SEM照片以检测磨损。切削结果表明，由于HPPMS技术的应用，与直流相比，HPPMS技术的切削性能得到了增强，从而实现了更致密的结构、更高的硬度、更光滑的表面和更好的厚度均匀性。
Hard and smooth coatings with high oxidation resistance and thermal stability are used for economical machining. In this regard, nc-(Ti,Al)N/a-Si3N4 films were sputtered on tungsten carbide cutting inserts and WC/Co samples by using an industrial CC800/9 high power pulse magnetron sputtering (HPPMS) coating unit. Coating composition and mechanical properties were investigated by scanning electron microscopy (EDS) and nano-indentation. Hardness was about 36 GPa for a silicon content of about 9.6 at%. Optical emission spectroscopy (OES) was done to detect the ionization fraction of deposition species and to compare it to direct current (dc). Deposition rate of the HPPMS coatings was 1.6 times higher on areas positioned orthogonal to the target compared to dc sputtered coatings. Finally cutting performance was compared to a state-of-the-art coating in turning HSS (high speed steel) under severe conditions. After the cutting tests SEM pictures were taken at the flank side of the cutting inserts to detect the wear. Cutting results show enhanced cutting performance due to the application of the HPPMS-technology resulting in denser structure, higher hardness, smoother surface and better thickness uniformity compared to dc.