WORK FUNCTION MEASUREMENTS ON (100) AND (110) SURFACES OF SILVER
WORK FUNCTION MEASUREMENTS ON (100) AND (110) SURFACES OF SILVER
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DOI：
10.1002/pssa.2210270126
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发表时间：
1975-01-01
期刊：
影响因子：
--
通讯作者：
MEE, CHB
中科院分区：
文献类型：
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作者：
DWEYDARI, AW;MEE, CHB
(100)和（110）银单晶在超高真空中通过电子和氩离子轰击进行清洁。用光电方法测定了大块晶体和在其上通过自外延形成的银膜的功函数。体相晶体的功函数分别为（4.64 ± 0.02）eV和（4.52 ± 0.02）eV。银膜的沉积的效果是降低功函数，但在500至600 K下的沉积和退火的连续循环导致功函数返回到非常接近于体晶体的值。在425 K下，分阶段沉积在云母衬底上的银退火膜的功函数为（4.72 ± 0.02）eV，对应于（111）银表面的功函数。如果云母在沉积期间保持在室温下，则功函数为约4.5eV。在石英衬底上制备的银多晶厚膜的功函数为（4.26 ± 0.02）eV。结果支持了功函数与表面原子密度的Smoluchowski关联。
(100) and (110) single crystals of silver were cleaned by electron and argon‐ion bombardment in ultra‐high vacuum. The work functions of the bulk crystals, and of silver films formed upon them by autoepitaxy, were determined photoelectrically. The bulk crystals had work functions of (4.64 ± 0.02) eV and (4.52 ± 0.02) eV respectively. The effect of the deposition of silver films was to reduce the work function, but continued cycles of deposition and annealing at 500 to 600 K caused the work function to return to a value very close to that of the bulk crystal. An annealed film of silver deposited in stages on a mica substrate at 425 K had a work function of (4.72 ± 0.02) eV, corresponding to that of the (111) silver surface. If the mica remained at room temperature during deposition, the work function was about 4.5 eV. The work function of a thick polycrystalline film of silver on quartz was (4.26 ± 0.02) eV. The results support the Smoluchowski correlation of work function with surface atom density.