Effects of Selective Phosphoric Acid Etching on Enamel Using "No-wait" Self-etching Adhesives
Effects of Selective Phosphoric Acid Etching on Enamel Using "No-wait" Self-etching Adhesives
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DOI：
10.3290/j.jad.a41359
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发表时间：
2018-09-01
影响因子：
3.3
通讯作者：
Tagami, Junji
中科院分区：
文献类型：
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作者：
Sato, Takaaki;Takagaki, Tomohiro;Tagami, Junji
目的：材料和方法：将Clearfil Universal Bond Quick（UBQ，Kuraray Noritake）或G-PremioBOND（GPB，GC）应用于研磨的人牙釉质表面。粘合剂以3种模式使用：无等待自蚀刻模式（UBQ-0或GPB-0）、10-s自蚀刻模式（UBQ-10或GPB-10）和具有磷酸蚀刻的选择性蚀刻模式（UBQ-PA或GPB-PA）。在酸碱挑战后，使用扫描电子显微镜（SEM）检查界面的形态属性，以表征耐酸碱区（ABRZ）。结果：各组牙釉质均形成ABRZ区，牙釉质的抗拉强度（UTS）和微剪切强度（mu SBS）均高于对照组。UBQ-PA和GPB-PA产生了较厚的ABRZ，在粘合剂-釉质界面下没有漏斗状侵蚀。UBQ-PA的μ SBS显著高于UBQ-0和UBQ-10（p < 0.05）。然而，GPB-0、GPB-10和GPB-PA之间的mu SBS没有统计学显著差异。对于UTS，UBQ是显着高于GPB。结论：选择性磷酸酸蚀创建一个稳定的粘接剂-釉质界面。无需等待的自蚀刻概念粘合剂导致更薄的ABRZ。μ SBS的结果表明，磷酸对牙釉质的酸蚀作用是材料依赖性的。
Purpose: To evaluate the effect of selective phosphoric acid etching on enamel using "no-wait" self-etching adhesives.Materials and Methods: Clearfil Universal Bond Quick (UBQ, Kuraray Noritake) or G-Premio BOND (GPB, GC) was applied to ground human enamel surfaces. The adhesives were used in 3 modes: no-waiting self-etching mode (UBQ-0 or GPB-0), 10-s self-etching mode (UBQ-10 or GPB-10), and the selective-etch mode with phosphoric acid etching (UBQ-PA or GPB-PA). After an acid-base challenge, the morphological attributes of the interface were examined using scanning electron microscopy (SEM) to characterize the acid-base resistant zone (ABRZ). Microshear bond strength (mu SBS) testing to enamel and ultimate tensile strength (UTS) of the adhesive resin were carried out.Results: ABRZ formation was confirmed in all groups. UBQ-PA and GPB-PA created thicker ABRZ with no funnel-shaped erosion beneath the adhesive-enamel interface. mu SBS of UBQ-PA was significantly higher than UBQ-0 and UBQ-10 (p < 0.05). However, there were no statistically signficant differences in mu SBS among GPB-0, GPB-10, and GPB-PA. For the UTS, UBQ was significantly higher than GPB.Conclusion: Selective phosphoric acid etching created a stable adhesive-enamel interface. The no-waiting self-etching concept adhesive led to a thinner ABRZ. The results of mu SBS suggest that phosphoric acid etching effects on enamel are material dependent.