Formation of Nitrogen-Vacancy Centers in Homoepitaxial Diamond Thin Films Grown via Microwave Plasma-Assisted Chemical Vapor Deposition
Formation of Nitrogen-Vacancy Centers in Homoepitaxial Diamond Thin Films Grown via Microwave Plasma-Assisted Chemical Vapor Deposition
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微波等离子体辅助化学气相沉积同质外延金刚石薄膜中氮空位中心的形成
DOI:
10.1109/tnano.2016.2528678
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发表时间:
2016
影响因子:
2.4
通讯作者:
and K. M. Itoh
中科院分区:
文献类型:
--
作者:
H. Watanabe;H. Umezawa;T. Ishikawa;K. Kaneko;S. Shikata;J. Ishi-Hayase;and K. M. Itoh
A model for controlling the two-dimensional distribution of negatively charged nitrogen-vacancy (NV-) fluorescent centers near the surface of a diamond crystal is presented, using only a microwave plasma-assisted chemical vapor deposition (CVD) method. In this approach, a CVD diamond layer is homoepitaxialy grown via microwave plasma-assisted CVD using an isotopically enriched methane (12CH4), hydrogen (H2), and nitrogen (N2) gas mixture on patterned diamond (0 0 1). When the surface is imaged by means of confocal microscope photoluminescence mapping, fine grooves are observed to have been generated artificially on the diamond surface. NV-centers are found to be distributed selectively into these grooves. These results demonstrate an effective means for the formation of NV-centers of selectable size and density via microwave plasma-assisted CVD, with potential application in the production of diamond quantum sensors.