Theoretical study of multiexposure zeroth-order waveguide mode interference lithography
Theoretical study of multiexposure zeroth-order waveguide mode interference lithography
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多重曝光零阶波导模干涉光刻理论研究
DOI：
10.1007/s11082-018-1601-2
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发表时间：
2018-09-01
影响因子：
3
通讯作者：
Qi, Yunping
中科院分区：
文献类型：
--
作者：
Pang, Zhiyuan;Tong, Huan;Qi, Yunping
提出了一种新的纳米光刻技术，其中样品旋转被纳入零阶波导模式干涉光刻。采用325 nm激光激发非对称金属包层介质波导结构加载的零阶波导模。利用有限元法对零阶波导模干涉的光场强度分布进行了数值模拟。光刻样品由玻璃基片、铝膜和光刻胶膜组成，样品上的旋转操作用坐标矩阵变换表示。通过两次、三次和连续曝光，得到了二维正方形晶格、二维六边形密排晶格和圆形光栅等各种亚波长结构。通过改变光刻胶的厚度，可以得到不同尺寸的亚波长结构。模拟得到的各种形状和尺寸的亚波长结构可应用于纳米光学领域。该技术简单、成本低，为干涉纳米光刻提供了一种灵活而有前途的方法。
A new nanolithography technique in which sample rotation is incorporated into zeroth-order waveguide mode interference lithography is proposed in this report. A 325-nm laser was used to excite zeroth-order waveguide modes, which were loaded by an asymmetric metal-cladding dielectric waveguide structure. The optical field intensity distribution of zeroth-order waveguide modes interference is numerically simulated using the finite element method. The lithography sample consisted of a glass substrate, Al film, and photoresist film, and the rotation operation on the sample is expressed in coordinate matrix transformation. Various subwavelength structures, such as two-dimensional square lattices, two-dimensional hexagonal closed-packed lattices,and circular gratings, were obtained through double, triple, and continuous exposure. These subwavelength structures with different sizes can be produced by changing the thickness of the photoresist. The subwavelength structures simulated with various shapes and sizes can be applied to the field of nano-optics. The proposed technique provides a flexible and promising approach for interference nanolithography because of its simplicity and low cost.