Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
复制标题
通过两步等离子体处理甲基丙烯酸酯基聚合物形成纳米厚分层非晶碳层
DOI：
--
复制
发表时间：
2015
期刊：
影响因子：
--
通讯作者：
G. Oehrlein
中科院分区：
文献类型：
--
作者：
D. Metzler;F. Weilnboeck;S. Hernández;S. Walton;R. Bruce;S. Engelmann;L. Salamanca;G. Oehrlein
作者表明，甲基丙烯酸酯基193nm光刻胶（PR）材料的扩展He等离子体预处理（PPT）与随后的偏置Ar等离子体处理相结合，可以导致聚合物表面形成气泡，这是由于低能离子轰击形成的超薄、离子诱导、致密、无定形碳（DAC）层分层。在我们的实验条件下，分层层厚度为1-2 nm，主要由sp2杂化的非晶碳组成。单独的氦或氩等离子体过程不会导致这种现象，到目前为止，作者只在甲基丙烯酸酯聚合物中观察到这种现象。超薄层形成的可能机制与所有观察结果一致：在He等离子体预处理过程中，挥发性物质是由紫外/真空紫外辐射诱导的聚合物悬垂基团（如金刚烷基）的光解和聚合物主链的断裂产生的，深度大于100 nm。挥发性产物形成c…
The authors show that extended He plasma pretreatment (PPT) of methacrylate-based 193 nm photoresist (PR) material in conjunction with a subsequent biased Ar plasma treatment can lead to blister formation at the polymer surface due to delamination of an ultrathin, ion-induced, dense, amorphous carbon (DAC) layer formed by low energy ion bombardment. For our experimental conditions, the delaminated layer is 1–2 nm thick and primarily composed of sp2-hybrized amorphous carbon. A He or Ar plasma process alone will not lead to this phenomenon, and so far the authors have only observed it for a methacrylate polymer. A possible mechanism of the formation of the ultrathin layer that is consistent with all observations is as follows: During He plasma pretreatment, volatile species are produced by ultraviolet/vacuum ultraviolet radiation-induced photolysis of the polymer pendant groups, e.g., adamantyl and chain-scissioning of the polymer backbone to a depth of greater than 100 nm. While volatile products formed c...