Purcell Factor for Plasmon-Enhanced Metal Photoluminescence
Purcell Factor for Plasmon-Enhanced Metal Photoluminescence
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DOI：
10.1021/acs.jpcc.3c00180
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发表时间：
2022-12
期刊：
影响因子：
--
通讯作者：
T. Shahbazyan
中科院分区：
文献类型：
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作者：
T. Shahbazyan
我们提出了一种分析模型，用于特征尺寸低于衍射极限的金属纳米结构中金属光致发光（MPL）的等离子体增强。在此类系统中，MPL 增强的主要机制是通过重组载流子激发局域表面等离子体 (LSP)，然后由于 LSP 辐射衰变而发射光子。对于任意形状的等离子体纳米结构，我们获得了 MPL Purcell 因子的通用表达式，该表达式描述了 MPL 在金属介电函数、LSP 频率和系统体积方面的等离子体增强。我们发现MPL光谱的线形受到直接载流子复合过程和等离激元天线介导的复合过程之间的干扰的影响，这导致在大量实验中观察到的散射光谱中MPL光谱带相对于LSP共振发生蓝移。
We present an analytical model for plasmonic enhancement of metal photoluminescence (MPL) in metal nanostructures with characteristic size below the diffraction limit. In such systems, the primary mechanism of MPL enhancement is excitation of localized surface plasmons (LSP) by recombining carriers followed by a photon emission due to LSP radiative decay. For plasmonic nanostructures of arbitrary shape, we obtain a universal expression for MPL Purcell factor that describes the plasmonic enhancement of MPL in terms of metal dielectric function, LSP frequency, and the system volume. We find that the lineshape of MPL spectrum is affected by the interference between direct carrier recombination processes and those mediated by plasmonic antenna which leads to a blueshift of MPL spectral band relative to LSP resonance in scattering spectra observed in numerous experiments.