Adsorption kinetics of organ-ophosphonic acids on plasma-modified oxide-covered aluminum surfaces
Adsorption kinetics of organ-ophosphonic acids on plasma-modified oxide-covered aluminum surfaces
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DOI:
10.1021/la8000619
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发表时间:
2008-08-19
期刊:
影响因子:
3.9
通讯作者:
Grundmeier, G.
中科院分区:
文献类型:
--
作者:
Giza, M.;Thissen, P.;Grundmeier, G.
Tailoring of oxide chemistry on aluminum by means of low-pressure water and argon plasma surface modification was performed to influence the kinetics of the self-assembly process of octadecylphosphonic acid monolayers. The plasma-induced surface chemistry was studied by in situ FTIR reflection-absorption spectroscopy (IRRAS). Ex situ IRRAS and X-ray photoelectron spectroscopy were applied for the analysis of the adsorbed self-assembled monolayers. The plasma-induced variation of the hydroxide to oxide ratio led to different adsorption kinetics of the phosphonic acid from dilute ethanol solutions as measured by means of a quartz crystal microbalance. Water plasma treatment caused a significant increase in the density of surface hydroxyl groups in comparison to that of the argon-plasma-treated surface. The hydroxyl-rich surface led to significantly accelerated adsorption kinetics of the phosphonic acid with a time of monolayer formation of less than 1 min. On the contrary, decreasing the surface hydroxyl density slowed the adsorption kinetics.