Structural characteristics of diamond-like nanocomposite films grown by PECVD
Structural characteristics of diamond-like nanocomposite films grown by PECVD
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DOI：
10.1016/s0167-577x(03)00053-3
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发表时间：
2003-07
影响因子：
3
通讯作者：
W. Yang;Y. Choa;T. Sekino;K. Shim;K. Niihara;K. Auh
中科院分区：
文献类型：
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作者：
W. Yang;Y. Choa;T. Sekino;K. Shim;K. Niihara;K. Auh
使用 CH4/(C2H5O)4Si/H2/Ar 气体混合物作为源气体，通过传统的等离子体增强化学气相沉积 (PECVD) 在 Si 基底上沉积类金刚石纳米复合材料 (DLN) 薄膜。通过透射电子显微镜（TEM）、傅里叶变换红外光谱仪（FT-IR）和拉曼光谱研究了薄膜结构。沉积的DLN薄膜主要由类金刚石a-C:H和类石英a-Si:O网络组成。研究了生长薄膜的机械和摩擦学性能以及微观结构的改变。为了了解DLN薄膜的特性，还使用CH4/H2气体通过相同的沉积工艺制备了类金刚石碳(DLC)薄膜。
Diamond-like nanocomposite (DLN) films have been deposited on Si substrates using CH4/(C2H5O)4Si/H2/Ar gas mixtures as source gases by conventional plasma-enhanced chemical vapor deposition (PECVD). The film structure was investigated by transmission electron microscope (TEM), Fourier transform infrared spectrometer (FT-IR) and Raman spectrometry. The DLN films deposited mainly consisted of diamond-like a-C:H and quartz-like a-Si:O networks. The mechanical and tribological properties as well as microstructural modifications of the grown films were investigated. In order to understand the characteristics of DLN films, the diamond-like carbon (DLC) films were also prepared using CH4/H2gases by the same deposition process.