A high brightness source for nano-probe secondary ion mass spectrometry

A high brightness source for nano-probe secondary ion mass spectrometry
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DOI:
10.1016/j.apsusc.2008.05.141
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发表时间:
2008-12-15
影响因子:
6.7
通讯作者:
Kinion, D. E.
Kinion, D. E.
中科院分区:
材料科学1区
文献类型:
--
作者:
Smith, N. S.;Tesch, P. P.;Kinion, D. E.

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在表面分析和表面加工领域,两种最流行的离子源技术是Duoplasmatron和液态金属离子源(LMIS)。在这一研究领域,人们做出了许多努力,以开发一种替代来源[S.K. Guharay,J. Orloff,M. Wada,IEEE Trans. Plasma Sci. 33(6)(2005)1911; N.S. Smith,W.P. Skoczylas,S.M.凯洛格,D.E. Kinion,P.P. Tesch,O. Sutherland,A. Aanesland,R.W.博斯韦尔,J.瓦克。Sci. Technol. B 24(6)(2006)2902-2906],具有LMIS的亮度,并且还具有产生二次离子产率增强物质例如氧的能力。LMIS的高亮度和小的虚拟源尺寸对于形成高分辨率探针是有利的,但是当需要超过100 nA的束电流时,由于来自光学柱的球面像差的影响,LMIS的高亮度和小的虚拟源尺寸是显著的缺点。在这些较高的电流下,具有高角强度的源是最佳的,并且事实上,当今的等离子体离子源的相对中等的亮度在该操作制度中占优势。LMIS和Duoplasmatron都遭受大的轴向能量扩展,导致在色度极限处形成聚焦光束时的进一步限制,其中品质因数与能量扩展的平方成反比。此外,这两种离子源的操作范围非常有限的离子species.This文章回顾了一些最新的发展和一些未来的潜力,在这一领域的仪器开发。在这里,我们提出了一种方法,源的发展,可以导致氧离子束西姆斯成像与10 nm的分辨率,使用“宽面积”RF气相离子源。(C)2008年爱思唯尔B。V.保留所有权利。
The two most prevalent ion source technologies in the field of surface analysis and surface machining are the Duoplasmatron and the liquid metal ion source (LMIS). There have been many efforts in this area of research to develop an alternative source [S.K. Guharay, J. Orloff, M. Wada, IEEE Trans. Plasma Sci. 33 (6) (2005) 1911; N.S. Smith, W.P. Skoczylas, S.M. Kellogg, D.E. Kinion, P.P. Tesch, O. Sutherland, A. Aanesland, R.W. Boswell, J. Vac. Sci. Technol. B 24 (6) (2006) 2902-2906] with the brightness of a LMIS and yet the ability to produce secondary ion yield enhancing species such as oxygen. However, to date a viable alternative has not been realized.The high brightness and small virtual source size of the LMIS are advantageous for forming high resolution probes but a significant disadvantage when beam currents in excess of 100 nA are required, due to the effects of spherical aberration from the optical column. At these higher currents a source with a high angular intensity is optimal and in fact the relatively moderate brightness of today's plasma ion sources prevail in this operating regime. Both the LMIS and Duoplasmatron suffer from a large axial energy spread resulting in further limitations when forming focused beams at the chromatic limit where the figure-of-merit is inversely proportional to the square of the energy spread. Also, both of these ion sources operate with a very limited range of ion species.This article reviews some of the latest developments and some future potential in this area of instrument development. Here we present an approach to source development that could lead to oxygen ion beam SIMS imaging with 10 nm resolution, using a 'broad area' RF gas phase ion source. (C) 2008 Elsevier B. V. All rights reserved.