Automated sub-100 nm local anodic oxidation (LAO)-directed nanopatterning of organic monolayer-modified silicon surfaces
Automated sub-100 nm local anodic oxidation (LAO)-directed nanopatterning of organic monolayer-modified silicon surfaces
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DOI：
10.1039/c1ra00450f
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发表时间：
2012-01-01
期刊：
影响因子：
3.9
通讯作者：
Herrier, Cyril
中科院分区：
文献类型：
--
作者：
Fabre, Bruno;Herrier, Cyril
报道了利用导电原子力显微镜针尖对不同有机单层膜（癸酸、十二酸、十六酸和十一酸）修饰的Si（111）表面进行局部阳极氧化（LAO）制备氧化硅纳米片。结果表明，氧化物形成的阈值偏置电压随着单层厚度的增加而增加，当使用酸端基代替甲基时，阈值偏置电压降低。LAO过程的自动化使矢量化复杂图纸（例如，G. Compass Card和Longship）在硅上使用十一烷酸单层作为模型分子抗蚀剂。在优化的实验条件下（即，施加到表面的偏压为8V，写入速率为1 μ m·s（-1）），电生成了具有高度可重复性和均匀性的2-3 nm厚的氧化物图案，最小横向分辨率为80 nm。有趣的是，氧化硅纳米颗粒已经被选择性地溶解在稀释的氟化氢溶液中，以产生潜在的反应性氢化区域。这些氢化的网站，然后已被用于无电沉积的金纳米粒子的电流位移。这种方法被认为是方便和快速的金属化最初产生的LAO的图案。随着金盐浓度从100 μ M降低到1 μ M，沉积的金颗粒的平均直径从20 nm降低到2 nm。
The fabrication of silicon oxide nanopatterns using the local anodic oxidation (LAO) by a conducting AFM tip of different organic monolayer (decyl, dodecyl, hexadecyl and undecanoic acid)-modified Si(111) surfaces is reported. It is demonstrated that the threshold bias voltage of oxide formation increases with the monolayer thickness and decreases when acid end groups are used instead of methyl. The automatization of the LAO process has allowed the perfect replication of vectorized complex drawings (e. g. compass card and longship) on silicon using the undecanoic acid monolayer as the model molecular resist. Under optimized experimental conditions (namely, bias voltage of 8 V applied to the surface and writing rate of 1 mu m s(-1)), highly reproducible and uniform 2-3 nm thick oxide patterns have been electrogenerated with a minimum lateral resolution of 80 nm. Interestingly, the silicon oxide nanopatterns have been selectively dissolved in diluted hydrogen fluoride solution to generate potentially reactive hydrogenated areas. These hydrogenated sites have then been used for the electroless deposition of gold nanoparticles by galvanic displacement. This approach was found to be convenient and fast to metallize the patterns initially produced by LAO. The average diameter of deposited gold particles decreased from 20 to 2 nm with decreasing the gold salt concentration from 100 to 1 mu M.