Synthesis and characterization of nickel-doped diamond-like carbon film electrodeposited at a low voltage

Synthesis and characterization of nickel-doped diamond-like carbon film electrodeposited at a low voltage
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DOI:
10.1016/j.surfcoat.2010.01.039
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发表时间:
2010-05
影响因子:
5.4
通讯作者:
Kedong Ma;Guangbin Yang;Laigui Yu;Ping-yu Zhang
Kedong Ma;Guangbin Yang;Laigui Yu;Ping-yu Zhang
中科院分区:
材料科学1区
文献类型:
--
作者:
Kedong Ma;Guangbin Yang;Laigui Yu;Ping-yu Zhang

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建立了一种简单有效的电沉积法制备镍掺杂类金刚石(ni -掺杂DLC)薄膜的方法。采用x射线光电子能谱(XPS)、拉曼散射光谱(Raman scattering spectroscopy)、扫描电镜(SEM)和透射电镜(TEM)对膜的形貌、组成和微观结构进行了研究。此外,使用UMT-2型通用微摩擦计对掺镍DLC薄膜的摩擦磨损行为进行了评价。结果表明,镍的加入有效降低了DLC膜的残余应力,提高了DLC膜的结合强度,从而显著提高了掺杂镍DLC膜的耐磨性。Ni掺杂导致DLC膜残余应力和结合强度降低的真正原因还需要进一步的研究。
A simple and effective electrodeposition process was established to synthesize nickel-doped diamond-like carbon (Ni-doped DLC) film. The morphology, composition, and microstructure of the film were investigated by means of X-ray photoelectron spectroscopy (XPS), Raman scattering spectroscopy, scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Moreover, a UMT-2 universal micro-tribometer was used to evaluate the friction and wear behavior of the Ni-doped DLC film. Results show the incorporation of nickel contributes to effectively decrease the residual stress and increase the bonding strength of the DLC film, which results in significantly increased wear resistance of the Ni-doped DLC film. Further work is needed to clarify the real reason why Ni doping leads to decreased residual stress and bonding strength of the DLC film.