From workplace air measurement results toward estimates of exposure? Development of a strategy to assess exposure to manufactured nano-objects

From workplace air measurement results toward estimates of exposure? Development of a strategy to assess exposure to manufactured nano-objects
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DOI:
10.1007/s11051-009-9772-1
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发表时间:
2009-11-01
影响因子:
2.5
通讯作者:
Mark, Dave
Mark, Dave
中科院分区:
材料科学4区
文献类型:
--
作者:
Brouwer, Derk;van Duuren-Stuurman, Birgit;Mark, Dave

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在过去的几年中,越来越多的研究工作场所的空气测量人造纳米材料和物体已发表。大多数研究更具探索性,因此对工人在特定暴露情况、活动或过程中的暴露进行直接解释并不是一个直截了当的过程。总的来说,这些研究使用了一套非常相似的设备,用于近实时监测粒径范围从< 100 nm到10 μ m的颗粒数量和质量浓度,并收集样品用于离线表征空气样品。可以观察到处理本底浓度的各种方法,以及利用本底浓度来指示接触纳米物体的可能性。在欧盟赞助的NANOSH项目内,制定了衡量战略、数据分析和报告的统一方法。除了大多数研究报告的时间/活性-浓度概况外,这种方法可以更定量地估计暴露于人造纳米物体的可能性。NANOSH数据将整理成一个基础,这个基础可能成为一个统一数据库的起点,以便在不久的将来进行全面分析,得出几种暴露情况的暴露估计。
In the past few years, an increasing number of studies on workplace air measurements on manufactured nano-materials and -objects have been published. Most of the studies had a more explorative character, so a direct interpretation to workers" exposure for a given exposure situation, activity, or process is not a straight-forward process. In general, the studies use a quite similar package of devices for near real-time monitoring of particle number- and mass concentration in size ranges < 100 nm up to 10 mu m, and the collection of samples for off-line characterization of air samples. Various approaches for addressing background concentrations and its use to indicate the potential for exposure to nano-objects could be observed. Within the EU-sponsored NANOSH project, a harmonized approach for measurement strategy, data analysis and reporting was developed. In addition to time/activity-concentration profiles as reported by most studies, this approach enables a first step to estimate the potential for exposure to manufactured nano-objects, more quantitatively. The NANOSH data will be collated into a base, which may form the starting point for a harmonized database facilitating overall analysis in near future, to derive estimates for exposure for several exposure situations.