Comparison testing of diamond-like a-C:H coatings prepared in plasma cathode-based gas discharge and ta-C coatings deposited by vacuum arc
Comparison testing of diamond-like a-C:H coatings prepared in plasma cathode-based gas discharge and ta-C coatings deposited by vacuum arc
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DOI：
10.1016/j.surfcoat.2010.05.020
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发表时间：
2010-09
影响因子：
5.4
通讯作者：
N. Gavrilov;A. Mamaev;S. Plotnikov;A. Rubshtein;I. Trakhtenberg;V. A. Ugov
中科院分区：
文献类型：
--
作者：
N. Gavrilov;A. Mamaev;S. Plotnikov;A. Rubshtein;I. Trakhtenberg;V. A. Ugov
研究了基于非自持空心阴极脉冲直流放电中乙炔分解的非晶碳涂层沉积方法。放电是通过基于直流辉光放电的栅极稳定等离子体阴极的电子发射来维持的。该方法允许放电间隙中的气压和非自持放电参数在较宽的范围内变化。它可以优化沉积涂层的性能，并对样品表面进行原位离子清洗和等离子体浸没离子注入以形成界面并提高涂层的附着力。 0.1-10μm厚的a-C:H薄膜以0.5-8μm/h的沉积速率沉积在碳化钨和不锈钢基底上。使用原子力显微镜（AFM）、扫描电子显微镜（SEM）和拉曼光谱方法对涂层进行了研究。测量算术平均表面粗糙度（9-34nm）、摩擦系数（0.01-0.3）、密度（2.2-2.4g/cm3）、显微硬度（16-75GPa）和薄膜内应力（3-7GPa）。将所得a-C:H涂层的性能与阴极真空电弧沉积得到的ta-C涂层的性能进行了比较。
The method of amorphous carbon coating deposition based on decomposition of acetylene in a non-self-sustained hollow cathode pulsed-DC discharge is investigated. The discharge is maintained by the electron emission of a grid-stabilized plasma cathode based on a DC glow discharge. The method allows the gas pressure in the discharge gap and the non-self-sustained discharge parameters to be varied in a wide range. It makes it possible to optimize the properties of the deposited coating and to perform in situ the preliminary ion cleaning of sample surface and the plasma immersion ion implantation to form an interface and to improve the coating's adhesion. The 0.1–10-μm-thick a-C:H films were deposited on tungsten carbide and stainless steel substrates at a deposition rate of 0.5–8μm/h. The coatings were investigated using the methods of atomic-force microscopy (AFM), scanning electron microscopy (SEM) and Raman spectroscopy. The arithmetic average surface roughness (9–34nm), the friction coefficients (0.01–0.3), the density (2.2–2.4g/cm3), the microhardness (16–75GPa) and the internal stresses in the films (3–7GPa) were measured. Comparison was made between the properties of the resulted a-C:H coating with the properties of the ta-C coating obtained by cathodic vacuum arc deposition.