Deposition and characterization of few-nanometers-thick superconducting Mo–Re films
Deposition and characterization of few-nanometers-thick superconducting Mo–Re films
复制标题
几纳米厚超导Mo-Re薄膜的沉积与表征
DOI：
10.1088/0953-2048/21/11/115006
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发表时间：
2008
影响因子：
3.6
通讯作者：
G. Gol’tsman
中科院分区：
文献类型：
--
作者：
V. Seleznev;M. Tarkhov;B. Voronov;I. Milostnaya;V. Lyakhno;A. Garbuz;M. Mikhailov;O. Zhigalina;G. Gol’tsman
我们报告了用于纳米线单光子超导探测器（SSPD）的几纳米厚超导钼铼（Mo-Re）薄膜的制造和研究。 Mo-Re薄膜是在氩气气氛中通过直流磁控溅射Mo(60)-Re(40)合金靶材沉积在蓝宝石基底上的。 2-10 nm 厚的薄膜的临界温度 (Tc) 为 5.6 至 9.7 K。HRTEM（高分辨率透射电子显微镜）分析表明薄膜具有均匀的结构。 XPS(X射线光电子能谱)分析显示Mo与Re原子比为0.575/0.425，氧浓度为10％，其他元素浓度为1％。
We report on the fabrication and investigation of few-nanometers-thick superconducting molybdenum–rhenium (Mo–Re) films intended for use in nanowire single-photon superconducting detectors (SSPDs). Mo–Re films were deposited on sapphire substrates by DC magnetron sputtering of an Mo(60)–Re(40) alloy target in an atmosphere of argon. The films 2–10 nm thick had critical temperatures (Tc) from 5.6 to 9.7 K. HRTEM (high-resolution transmission electron microscopy) analysis showed that the films had a homogeneous structure. XPS (x-ray photoelectron spectroscopy) analysis showed the Mo to Re atom ratio to be 0.575/0.425, oxygen concentration to be 10%, and concentration of other elements to be 1%.