Photoluminescence excitation spectroscopy of GaAs:Er,O in the near‐band‐edge region
Photoluminescence excitation spectroscopy of GaAs:Er,O in the near‐band‐edge region
复制标题
GaAs:Er,O 近带边区域的光致发光激发光谱
DOI:
--
复制
发表时间:
1996
期刊:
影响因子:
--
通讯作者:
A. Taguchi
中科院分区:
文献类型:
--
作者:
R. Hogg;K. Takahei;A. Taguchi
We report a spectroscopic study of GaAs:Er,O samples grown by metalorganic chemical vapor deposition, with excitation in the near‐band‐edge region, 1.22–1.62 eV. Photoluminescence under host‐excitation is dominated by luminescence due to the Er‐2O center (an erbium atom at a gallium site coupled with two adjacent oxygen atoms) in these samples. The characterization of different Er centers is demonstrated by the observation of 4I15/2→4I11/2 intra‐4f‐shell transitions by photoluminescence excitation (PLE) spectroscopy. The transitions between these crystal‐field‐split 4f‐shell levels are observed at ∼1.26 eV (∼980 nm) which is at an energy attainable by PLE spectroscopy with a Ti:Sapphire laser. Two lines are assigned to the Er‐2O center. This allows a semi‐quantitative measurement of the relative concentrations of different centers to be made. PLE spectroscopy was also employed to study the trap levels related to the Er‐2O center. However, we find no evidence for such a trap level in this energy range. The...