Mossbauer study of iron fluoride films produced by pulsed laser deposition

Mossbauer study of iron fluoride films produced by pulsed laser deposition
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脉冲激光沉积产生的氟化铁薄膜的穆斯堡尔研究

DOI:
10.1007/s10967-014-3523-1
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发表时间:
2015
期刊:
J. Radioanal. Nucl. Chem.
影响因子:
--
通讯作者:
Y. Kobayash
Y. Kobayash
中科院分区:
--
文献类型:
--
作者:
K. Shiga;Y. Yamada;Y. Kobayash

文献摘要

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采用激光蒸发铁原子与六氟化硫(SF6)气体反应制备了氟化铁薄膜。采用Mössbauer光谱、粉末x射线衍射和扫描电子显微镜对氟化铁薄膜进行了研究。氟化铁薄膜的组成随环境sf6气体压力的变化而变化:在高压下得到fef3,在低压下得到fef2。此外,脉冲激光沉积过程中,薄膜中fef3晶粒的大小受衬底温度的控制。
Iron fluoride thin films were produced by the reaction of laser-evaporated iron atoms with sulfur hexafluoride (SF6) gas. The iron fluoride films were investigated using Mössbauer spectroscopy, powder X-ray diffraction, and scanning electron microscopy. The composition of the iron fluoride films changed according to the pressure of ambient SF6gas: FeF3was obtained at high pressure, while FeF2was obtained at low pressure. In addition, the size of FeF3crystallites produced in the film was controlled by the substrate temperature during pulsed laser deposition.