Percolation and Continuation Thickness of Ag Films on the Initial Growth Stage
Percolation and Continuation Thickness of Ag Films on the Initial Growth Stage
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银膜生长初期的渗流及延续厚度
DOI：
10.3379/jmsjmag.22.453
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发表时间：
1998
影响因子：
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通讯作者：
T. Shiba
中科院分区：
文献类型：
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作者：
M. Tsunoda;T. Ito;M. Takahashi;T. Shiba
讨论了气相沉积银膜在后成核阶段的聚结过程。在沉积过程中和沉积后，表面声波（SAW）的振幅V上传播的压电基板上，通过薄膜沉积在它上面，和薄膜，Rsq，的电片电阻率进行了测量。用扫描电子显微镜观察了不同厚度d的薄膜的微观结构。结果发现，（1）V达到最小值时的厚度dp对应于膜岛开始渗透的临界厚度，（2）1/Rsq开始与膜厚度成比例时的厚度dc对应于膜变得二维连续时的临界厚度，（3）dp和dc随着沉积速率降低而变大，（4）在聚并早期（d<dp），微结构变化进行，平均岛间距增大。从这些结果中，我们可以得出结论，较高的沉积速率是必要的，以抑制岛的微观结构的变化，并允许连续的超薄薄膜的制造。
Growth of vapor-deposited Ag films by the coalescence process in the post-nucleation stage is discussed. During and after deposition, the amplitude V of surface acoustic waves (SAW) propagated on the piezoelectric substrate through the films deposited on it, and the electric sheet resistivity of the films, Rsq, were measured. The microstructures of films with various thicknesses d were examined with a scanning electron microscope. As a result, it was found that (1) the thickness dp at which V reaches a minimum value corresponds to the critical thickness at which the islands of a film begin to percolate, (2) the thickness dc at which 1/Rsq begins to be proportional to the film thickness corresponds to the critical thickness at which the film becomes two-dimensionally continuous, (3) dp and dc become larger with decreasing deposition rate, and (4) in the early coalescence stage (d<dp), the microstructural change progresses, increasing the average inter-island spacing. From these results, we can conclude that a higher deposition rate is necessary to suppress the microstructural change of islands and to allow fabrication of continuous ultra-thin films.
M.Yamamoto：“超薄膜光学特性的原位椭圆测量研究”Appl.Opt.(1992)
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