Low-Temperature and Nano-Suiface Modification of Materials with Low-Damage Plasma and Photon-Induced Phonon Excitation Processes

Low-Temperature and Nano-Suiface Modification of Materials with Low-Damage Plasma and Photon-Induced Phonon Excitation Processes
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利用低损伤等离子体和光子诱导声子激发过程对材料进行低温和纳米表面改性

DOI:
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发表时间:
2007
期刊:
The international workshop on advanced thin films and surface technology, Changwon, Korea., Novemver 13, 2007
影响因子:
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通讯作者:
Setsuhara
Setsuhara
中科院分区:
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文献类型:
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作者:
Y.;Setsuhara

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