Oxidation of thin chromium nitride films: kinetics and morphology
Oxidation of thin chromium nitride films: kinetics and morphology
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氮化铬薄膜的氧化：动力学和形态
DOI：
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发表时间：
1996
期刊：
影响因子：
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通讯作者：
O. Schulte
中科院分区：
文献类型：
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作者：
T. Kacsich;K. Lieb;A. Schaper;O. Schulte
用磁控溅射法制备了厚度为150 ~ 500nm的氮化铬膜，并进行了化学计量学研究。采用卢瑟福后向散射光谱、共振核反应分析、扫描力显微镜（SFM）和x射线衍射等手段研究了氧化过程中氧化垢的生长、形貌和相变。发现并解释了对数和抛物线相结合的尺度增长，这是由于氧通过晶界向内扩散（对数）和Cr向外晶格扩散（抛物线）。pt标记实验证实了这一解释。两个过程的活化能分别为Q = 60（20）和。在氧化过程中观察到向CrN的转变。表面粗糙度和表面晶粒尺寸随氧化层厚度呈线性增加。
Magnetron-sputtered, 150 - 500 nm thick chromium nitride films of CrN and stoichiometry were exposed to air at 500 - . Oxide scale growth and morphology and the phase transformations during oxidation were investigated by means of Rutherford backscattering spectrometry, resonant nuclear reaction analysis, scanning force microscopy (SFM) and x-ray diffraction. A combined logarithmic and parabolic scale growth was found and interpreted as due to inwards diffusion of oxygen via grain boundaries (logarithmic) and outwards lattice diffusion of Cr (parabolic). Pt-marker experiments confirmed this interpretation. The activation energies of the two processes were determined to be Q = 60(20) and . During oxidation of a transformation into CrN was observed. A linear increase in the surface roughness and surface grain size with the oxide layer thickness was found by SFM.