Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology
Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology
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开发用于极紫外掩模检测和计量的具有高次谐波发生源的相干极紫外散射测量显微镜
DOI：
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发表时间：
2012
期刊：
影响因子：
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通讯作者：
Hiroo Kinoshita
中科院分区：
文献类型：
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作者：
Masato Nakasuji;Akifumi Tokimasa;Tetsuo Harada;Yutaka Nagata;Takeo Watanabe;Katsumi Midorikawa;Hiroo Kinoshita
