Mesostructured germanium with cubic pore symmetry

Mesostructured germanium with cubic pore symmetry
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DOI:
10.1038/nature04833
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发表时间:
2006-06-28
期刊:
影响因子:
64.8
通讯作者:
Kanatzidis, Mercouri G.
Kanatzidis, Mercouri G.
中科院分区:
综合性期刊1区
文献类型:
--
作者:
Armatas, Gerasimos S.;Kanatzidis, Mercouri G.

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规则介孔氧化物材料已被广泛研究(1-8),并在催化、吸附和分离等方面具有广泛的潜在应用。人们通常不会考虑它们的光学和电学性质。带有纳米孔的元素半导体代表了一种不同形式的框架材料,其物理特性与更传统的块状、薄膜和纳米晶体形式形成对比(1)。在这里,我们描述了立方介观结构的锗,MSU-Ge-1,含有表面活性剂分子的回转通道,由位于回转(G)最小表面上的无定形壁隔开,如在介孔二氧化硅MCM-48(参考文献.2)。尽管Ge是一种高熔点的共价半导体,很难通过溶液聚合来制备,但我们成功地利用合适的Ge42原子前驱体组装了一个连续的Ge网络。我们的结果表明,元素周期表第14族的元素半导体可以采用介观结构形式,如MSU-Ge-1,其特征是在bard空间群对称性上具有两个服从Ia(3)的三维迷宫隧道,并被一个连续的无定形的Ge最小表面分开。这种新结构的结果是,锗的壁厚只有一纳米,比结晶态或非晶态锗的电子能带隙(1.4 eV比0.66 eV)更宽。MSU-Ge-1的受控氧化产生了一系列具有连续变化的Ge:O比和平稳增加的能隙的Ge亚氧化物。
Regular mesoporous oxide materials have been widely studied(1-8) and have a range of potential applications, such as catalysis, absorption and separation. They are not generally considered for their optical and electronic properties. Elemental semiconductors with nanopores running through them represent a different form of framework material with physical characteristics contrasting with those of the more conventional bulk, thin film and nanocrystalline forms(1). Here we describe cubic mesostructured germanium, MSU-Ge-1, with gyroidal channels containing surfactant molecules, separated by amorphous walls that lie on the gyroid (G) minimal surface as in the mesoporous silica MCM-48 (ref. 2). Although Ge is a high-melting, covalent semiconductor that is difficult to prepare from solution polymerization, we succeeded in assembling a continuous Ge network using a suitable precursor for Ge 42 atoms. Our results indicate that elemental semiconductors from group 14 of the periodic table can be made to adopt mesostructured forms such as MSU-Ge-1, which features two three-dimensional labyrinthine tunnels obeying Ia (3) over bard space group symmetry and separated by a continuous germanium minimal surface that is otherwise amorphous. A consequence of this new structure for germanium, which has walls only one nanometre thick, is a wider electronic energy bandgap (1.4 eV versus 0.66 eV) than has crystalline or amorphous Ge. Controlled oxidation of MSU-Ge-1 creates a range of germanium suboxides with continuously varying Ge:O ratio and a smoothly increasing energy gap.