Erratum to: Toward multiscale modeling of thin-film growth processes using SLKMC
Erratum to: Toward multiscale modeling of thin-film growth processes using SLKMC
复制标题
勘误表：使用 SLKMC 进行薄膜生长过程的多尺度建模
DOI：
10.1557/jmr.2018.44
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发表时间：
2018
影响因子：
2.7
通讯作者：
T. Rahman
中科院分区：
文献类型：
--
作者：
S. Acharya;T. Rahman
Acharya和Rahman1的论文无意中发表在《材料研究杂志》第33卷第6期上。这篇文章是《材料研究杂志》关于材料科学中先进原子算法的焦点问题的一部分，并在该问题的介绍中引用。
The paper by Acharya and Rahman1 was inadvertently published in Volume 33, Issue 6 of Journal of Materials Research . The article is part of the Journal of Materials Research Focus Issue on Advanced Atomistic Algorithms in Materials Science and is referenced as such in the introduction to that issue.2