Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments
Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments
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锡 DPP 源极收集器模块 (SoCoMo)：Beta 产品状态和 HVM 开发
DOI：
10.1117/12.846545
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发表时间：
2010
期刊：
影响因子：
--
通讯作者：
Marc Corthout
中科院分区：
文献类型：
--
作者：
M. Yoshioka;Y. Teramoto;P. Zink;G. Schriever;G. Niimi;Marc Corthout
对于工业EUV（极紫外）光刻应用，需要中心波长为13.5nm的高功率EUV光源。Philips Extreme UV GmbH、EUVA和XTREME technologies GmbH联合开发了锡DPP（放电产生等离子体）源系统。本文的第一部分重点介绍了阿尔法EUV光源在该领域取得的成果。在过去集成电源升级后，现在的重点是系统的可靠性和可扩展性。本文的第二部分介绍了可用于光刻设备制造商的第一批预生产扫描仪工具的Beta SoCoMo。性能将在中间焦点的功率、剂量稳定性和产品可靠性以及其可达到的收集器寿命方面显示，这是操作成本的主要因素。在论文的第三部分中，描述了大批量制造（HVM）阶段的发展。根据Beta版的实施情况和用这些设计校准的有关模型，可以证明在实际中可以解决源的热定标和碎片缓减方面的基本工程挑战。HVM阶段所需的进一步效率改进也将基于实验显示。因此，进一步的HVM路线图可以作为Beta产品的进化步骤来实现。
For industrial EUV (extreme ultra-violet) lithography applications high power EUV light sources are needed at a central wavelength of 13.5 nm. Philips Extreme UV GmbH, EUVA and XTREME technologies GmbH have jointly developed tin DPP (Discharge Produced Plasma) source systems. This paper focuses in the first part on the results achieved from the Alpha EUV sources in the field. After integration of power upgrades in the past, now the focus is on reliability and uptime of the systems. The second part of this paper deals with the Beta SoCoMo that can be used in the first pre-production scanner tools of the lithography equipment makers. The performance will be shown in terms of power at Intermediate Focus, dose stability and product reliability but also its reachable collector lifetime, the dominant factor for Cost of Operation. In the third part of the paper the developments for the high volume manufacturing (HVM) phase are described. The basic engineering challenges in thermal scaling of the source and in debris mitigation can be proven to be solvable in practice based on the Beta implementation and related modeling calibrated with these designs. Further efficiency improvements required for the HVM phase will also be shown based on experiments. The further HVM roadmap can thus be realized as evolutionary steps from the Beta products.