Decomposition of dimethyl phthalate in an aqueous solution by ozonation with high silica zeolites and UV radiation.
Decomposition of dimethyl phthalate in an aqueous solution by ozonation with high silica zeolites and UV radiation.
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DOI：
10.1016/j.jhazmat.2007.12.091
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发表时间：
2008-09
影响因子：
13.6
通讯作者：
Yi-Hung Chen;N. Shang;Da-Cheng Hsieh
中科院分区：
文献类型：
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作者：
Yi-Hung Chen;N. Shang;Da-Cheng Hsieh
研究了高硅沸石和紫外线辐射对邻苯二甲酸二甲酯（DPB）的强化臭氧氧化作用。在不同反应条件下进行了半间歇式臭氧氧化实验，考察了进气臭氧浓度、高硅沸石投加量和紫外辐射强度对臭氧分解的影响。通过O3和O3/UV处理，可以有效地实现完全去除废水中的有害物质。注意，高硅沸石的存在加速了O3过程中的分解速率。另一方面，化学需氧量（COD）和总有机碳（TOC）的去除效率显着提高，采用臭氧与紫外辐射相结合。O3/UV工艺也有利于进料臭氧的利用效率，特别是在臭氧化后期。进而，求出COD去除率（%）与消耗的臭氧相对于被臭氧处理物的摩尔比（molmol-1）之间的相关性。臭氧氧化过程中TOC与COD的去除关系也比较明确。研究结果表明，高硅沸石与紫外辐射协同臭氧氧化系统对水中有机物的去除具有一定的适应性，为工程应用提供了参考。
This study investigates the enhanced ozonation of dimethyl phthalate (DMP), which is a pollutant of concern in water environments, with high silica zeolites and ultraviolet (UV) radiation. Semibatch ozonation experiments are performed under various reaction conditions to examine the effects of inlet gas ozone concentration, high silica zeolite dosage, and UV radiation intensity on the decomposition of DMP. The complete removal of DMP can be efficiently achieved via both O3and O3/UV treatments. Note that the presence of high silica zeolites accelerates the decomposition rate of DMP in the O3process. On the other hand, the removal efficiencies of both chemical oxygen demand (COD) and total organic carbons (TOC) are significantly enhanced by employing the ozonation combined with UV radiation. The O3/UV process is also advantageous for the utilization efficiency of fed ozone especially in the late ozonation period. Furthermore, the correlation between the COD removal percentage (%) and the mole ratio of ozone consumed to the DMP treated (molmol−1) is obtained. The clear-cut removal relationship of the TOC with COD during the ozonation of DMP has also been presented. Consequently, the results evaluate the flexibility of ozonation system associated with high silica zeolites and UV radiation for the removal of DMP and provide the useful information in engineering application.