Study on Energetic Ions Behavior in Plasma Facing Materials at Lower Temperature
Study on Energetic Ions Behavior in Plasma Facing Materials at Lower Temperature
复制标题
低温等离子体表面材料中高能离子行为的研究
DOI：
10.1238/physica.topical.103a00117
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发表时间：
2003
期刊：
影响因子：
2.9
通讯作者：
K. Okuno
中科院分区：
文献类型：
--
作者：
Y. Morimoto;T. Sugiyama;S. Akahori;H. Kodama;E. Tega;M. Sasaki;M. Oyaidu;H. Kimura;K. Okuno
建立了一套能谱仪，用于研究含能氢同位素与面向等离子体材料的相互作用。该装置的一个显著特点是在150 K左右进行高能离子注入，通过抑制热化离子的反应来研究高能离子与基体的反应。利用该装置，在173和373 K下对热解石墨进行了含能D2+离子注入的TDS实验。实验结果表明，注入的氘通过四步脱附过程释放，包括三个D2脱附过程和一个CDx脱附过程（x = 2，3，4）。在700 ~ 1200 K温度范围内观察到氘和CDx的两个脱附过程。此外，在173 K下，氘注入样品还观察到一个新的氘脱附过程。在高于室温（R.T.）的温度下注入氘的石墨从未观察到这一点。
An apparatus equipped with X-ray Photoelectron Spectroscopy (XPS) and Thermal Desorption Spectroscopy (TDS) was constructed to study interactions of energetic hydrogen isotopes with plasma facing materials. It is a remarkable feature of the apparatus that energetic ion implantation is carried out at around 150 K to study reactions of energetic ions with matrix by suppressing the reactions of thermalized ions. Using this apparatus, TDS experiments for pyrolytic graphite implanted with energetic D2+ ions at 173 and 373 K were carried out. The experimental results suggest that the deuterium implanted was released through a four-step release processes, involving three D2 and one CDx (x = 2, 3 and 4) desorption processes. Two deuterium and CDx desorption processes were observed in the temperature range from 700 to 1200 K. In addition, a new deuterium desorption process was observed for the deuterium-implanted sample at 173 K. This has never been observed for deuterium-implanted graphite implanted at temperatures higher than room temperature (R.T.).