A route to fabricate nanocontacts by X-ray lithography for the realization of single electron transistors and highly sensitive biosensors
A route to fabricate nanocontacts by X-ray lithography for the realization of single electron transistors and highly sensitive biosensors
复制标题
通过 X 射线光刻制造纳米接触的途径,用于实现单电子晶体管和高灵敏度生物传感器
DOI:
10.1016/j.matlet.2006.03.084
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发表时间:
2006
影响因子:
3
通讯作者:
M. Tormen
中科院分区:
文献类型:
--
作者:
S. Carrara;D. Ricci;E. Zitti;E. Fabrizio;M. Altissimo;M. Tormen
The fabrication of single electron transistors and/or highly sensitive biosensors is still a challenging task on account of the tight control required to get proper shapes and size of the electrodes. The nanosized tips and the separation of a few nanometers between electrode pairs are critical features. Conventional lithography is not suited to obtain these features because of the resolution limits, so that previous alternative approaches have involved the use of electron beam lithography, focused ion beam lithography or scanning probe nanolithography. The novel approach presented in this letter is the exploitation of X-ray lithography in the Elettra synchrotron to fabricate arrays of nanocontacts spaced a few nanometers, devoted to the design of a new class of nanodevices based on nanoparticles and/or single molecules, including single electron transistors and highly sensitive biosensors. The method to fabricate such devices is illustrated and discussed. Experimental details of the fabrication process are given and preliminary results are presented through SEM and AFM images. It is worth noting that this paper presents a viable method to produce nanocontacts by using the X-ray lithography by synchrotron radiation source, that has not yet been reported together with experimental, though preliminary, data.