Optical coatings deposited using ion assisted deposition
Optical coatings deposited using ion assisted deposition
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使用离子辅助沉积沉积光学涂层
DOI：
10.1116/1.574940
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发表时间：
1987
期刊：
影响因子：
--
通讯作者：
J. McNeil
中科院分区：
文献类型：
--
作者：
J. Mcnally;K. Jungling;F. Williams;J. McNeil
研究了氧离子辅助沉积（IAD）制备的Ta 2 O 5和Al 2 O3光学薄膜的性能。在此之前，我们报告了使用IAD沉积的Ta 2 O 5和Al 2 O3涂层的初步结果。在本文中，我们提出的结果说明了氧离子轰击对薄膜光学常数，环境耐久性和抗激光损伤性的影响。在沉积过程中，用200-、300-、500-和1000-eV的氧离子轰击涂层。增加的值的折射率，同时获得O+2轰击沉积的涂层。使用IAD沉积的减反射涂层在λ=351 nm处没有表现出增加的激光损伤阈值。
The properties of Ta2O5 and Al2O3 optical coatings deposited using oxygen‐ion assisted deposition (IAD) were investigated. Previously,1 we reported preliminary results for Ta2O5 and Al2O3 coatings deposited using IAD. In this paper, we present results illustrating the effects of oxygen‐ion bombardment on film optical constants, environmental durability, and laser damage resistance. The coatings were bombarded with 200‐, 300‐, 500‐, and 1000‐eV oxygen ions during deposition. Increased values of refractive index were obtained for coatings deposited with simultaneous O+2 bombardment. Antireflection coatings deposited using IAD did not exhibit increased laser damage thresholds at λ=351 nm.