Surface morphology and photoelectric properties of FTO ceramic thin films under a simple transparent cover-assisted laser annealing
Surface morphology and photoelectric properties of FTO ceramic thin films under a simple transparent cover-assisted laser annealing
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简单透明盖辅助激光退火下FTO陶瓷薄膜的表面形貌和光电性能
DOI：
10.1016/j.materresbull.2018.09.002
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发表时间：
2018-12-01
影响因子：
5.4
通讯作者：
Ren, Nai-fei
中科院分区：
文献类型：
--
作者：
Li, Bao-jia;Yang, Guang-yu;Ren, Nai-fei
提出了一种简单的透明盖辅助激光退火策略，使用盖玻片或 PET 片作为透明盖，以提高氟掺杂氧化锡（FTO）薄膜的光电性能。还进行了纯激光退火以进行比较。研究发现，透明盖辅助激光退火可以更有效地产生密集分布的颗粒，降低表面粗糙度并增大晶粒尺寸，从而提高薄膜的透射率和导电率。更重要的是，与盖玻片辅助激光退火相比，PET辅助激光退火使薄膜表面覆盖有更均匀、更致密的颗粒，晶粒尺寸显着增大。因此该薄膜的总透过率最高为84.32%，镜面透过率最高为75.88%，雾度略有下降10.01%，方块电阻最低为7.36Ω/sq。简单的 PET 辅助激光退火方法可能是传统激光退火处理的有前景的替代方法。
A simple transparent cover-assisted laser annealing strategy, which used a coverglass or a PET sheet as the transparent cover, was proposed to improve photoelectric properties of fluorine-doped tin oxide (FTO) thin films. Pure laser annealing was also performed for comparison. Transparent cover-assisted laser annealing was found to be more effective for producing densely distributed particles, decreasing surface roughness and increasing grain size, thus enhancing transmittance and conductivity of the film. More importantly, compared with coverglass-assisted laser annealing, PET-assisted laser annealing enabled the film surface to be covered with more uniform and denser particles and exhibit a remarkable increase in grain size. Therefore the film had the highest total transmittance of 84.32%, the highest specular transmittance of 75.88%, a slightly decreased haze of 10.01% and the lowest sheet resistance of 7.36 Omega/sq. The simple PET-assisted laser annealing method may be a promising substitution for the conventional laser annealing treatment.