Cohesion Property of Polymer Aggregates in Resist Pattern Analyzed by Atomic Force Microscope (AFM).
Cohesion Property of Polymer Aggregates in Resist Pattern Analyzed by Atomic Force Microscope (AFM).
复制标题
通过原子力显微镜 (AFM) 分析抗蚀剂图案中聚合物聚集体的内聚特性。
DOI：
10.2494/photopolymer.15.371
复制
发表时间：
2002
影响因子：
0.8
通讯作者：
A. Kawai
中科院分区：
文献类型：
--
作者：
A. Kawai
利用原子力显微镜（AFM）的微悬臂尖端，可以控制聚合物聚集体以线阻模式凝聚。在电阻与衬底界面处发现了一个聚合物聚集的空位，这导致了随后的蚀刻失败，并削弱了抗蚀图案的内聚强度。利用原子力显微镜尖端，对宽度为60 ~ 152nm、高度为220nm的电子束（EB）抗蚀图进行了定量分析。图案折叠所需的载荷随图案宽度的减小而减小。基于骨料模型的内应力和变形分析很好地解释了线抗模式的破坏特性。
By using a micro cantilever tip of atomic force microscope (AFM), polymer aggregates condensed in a line resist pattern can be manipulated. A vacancy of polymer aggregate is found out at the resist-substrate interface, which acts to induce the subsequent etching failure and to weaken cohesion strength of the resist pattern. Quantitative analysis of collapse property of an electron beam (EB) resist pattern ranging from 60 to 152nm width and 220nm height is demonstrated experimentally by using the AFM tip. The load required for pattern collapse decreases with decreasing the pattern width. Internal stress and deformation analysis based on the aggregate model explains well the collapse property of the line resist pattern.