From cyclotetrasilazane [(CH3)2SiNH]4 via crystalline silicon nitride imide Si2N2NH to α‐Si3N4
From cyclotetrasilazane [(CH3)2SiNH]4 via crystalline silicon nitride imide Si2N2NH to α‐Si3N4
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从环四硅氮烷 [(CH3)2SiNH]4 经由结晶氮化硅酰亚胺 Si2N2NH 到 α-Si3N4
DOI：
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发表时间：
1993
期刊：
影响因子：
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通讯作者：
U. Klingebiel
中科院分区：
文献类型：
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作者：
S. Schaible;R. Riedel;E. Werner;U. Klingebiel
以环低聚硅氮烷[(CH3)2SiNH]4为原料，采用氨热合成法合成α-Si3N4。[(CH3)2SiNH]4在氨气存在下，在900℃、80 MPa压力下反应生成氮化硅亚胺（Si2N2NH）。随后，Si2N2NH在1500℃、0.1 MPa氮气条件下热分解转化为α-Si3N4，同时NH3损失。
α-Si3N4 is synthesized by an ammonia thermal synthesis using a cyclic oligosilazane, [(CH3)2SiNH]4, as the starting material. [(CH3)2SiNH]4 reacts in the presence of ammonia at 900°C and 80 MPa pressure to give silicon nitride imide (Si2N2NH). Subsequently, Si2N2NH is converted into α-Si3N4 by thermal decomposition at 1500°C and 0.1 MPa nitrogen with the simultaneous loss of NH3.