Microstructure, physical and chemical properties of nanostructured (Ti-Hf-Zr-V-Nb)N coatings under different deposition conditions
Microstructure, physical and chemical properties of nanostructured (Ti-Hf-Zr-V-Nb)N coatings under different deposition conditions
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DOI：
10.1016/j.matchemphys.2014.06.062
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发表时间：
2014-10-15
影响因子：
4.6
通讯作者：
Sobol, O. V.
中科院分区：
文献类型：
--
作者：
Pogrebnjak, A. D.;Yakushchenko, I. V.;Sobol, O. V.
采用阴极电弧气相沉积法在不同沉积条件下制备了高熵合金和氮化物涂层(TiHfZrVNb)N。通过EDS和SEM分析、“α-sin(2)psi”测量方法和慢速正电子束的X射线衍射对(TiHfZrVNb)N涂层的成分、晶体结构、应变应力状态、深度和表面的缺陷和原子分布进行了表征。研究了氮化物薄膜在600℃退火后的氧化行为。结果表明氮化物涂层呈现面心立方晶体结构。发现了元素和缺陷的重新分布，以及由于热刺激扩散引起的排列（偏析）以及界面附近、晶粒和亚晶粒周围旋节线偏析的终止。氮化膜的峰值硬度和模量分别为44.3和384 GPa。 (TiHfZrVNb)N 涂层针对 AISI 1045 的摩擦学性能通过球盘摩擦仪在 3.0 N 的施加载荷下进行评估。 (C) 2014 Elsevier B.V. 保留所有权利。
High-entropy alloy and nitride coatings (TiHfZrVNb)N were prepared by the cathodic-arc-vapor-deposition method under various deposition conditions. The composition, crystal structure, strain-stress state, profiles of defects and atoms in-depth and at surfaces of the (TiHfZrVNb)N coatings were characterized by EDS and SEM analysis, X-ray diffraction with "alpha-sin(2)psi" method of measurements and slow positron beam. The oxidation behavior of nitride films after annealing at 600 degrees C temperature was studied. The results indicate that nitride coatings show the face-centered cubic crystal structure. The redistributions of elements and defects, their arrangement (segregation) due to the thermally stimulated diffusion and termination of the spinodal segregation near the interfaces, around the grains and subgrains were found. The peak hardness and modulus of the nitride films were 44.3 and 384 GPa, respectively. The tribological properties of the (TiHfZrVNb)N coatings against AISI 1045 were evaluated by a ball-on-disc tribometer with a 3.0 N applied load. (C) 2014 Elsevier B.V. All rights reserved.