Fabrication of large-area periodic nanopillar arrays for nanoimprint lithography using polymer colloid masks
Fabrication of large-area periodic nanopillar arrays for nanoimprint lithography using polymer colloid masks
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DOI：
10.1002/adma.200304824
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发表时间：
2003-07-04
影响因子：
29.4
通讯作者：
Chen, P
中科院分区：
文献类型：
--
作者：
Kuo, CW;Shiu, JY;Chen, P
大面积，有序，周期性纳米柱阵列（见图）可以使用双层纳米球光刻和反应离子蚀刻的组合。通过这种方法制造的纳米柱阵列可以反过来用作纳米压印光刻的印模。结果表明，这种方法可以用来产生大面积的子50 nm周期性纳米结构。
Large-area, well-ordered, periodic nanopillar arrays (see Figure) can be fabricated using a combination of double-layer nanosphere lithography and reactive ion etching. The nanopillar arrays fabricated by this method can, in turn, be used as the stamps for nanoimprint lithography. The results presented indicate that this approach can be used to produce large-area sub-50 nm periodic nanostructures.