Fabrication of 50-nm period gratings on GaN in air through plasmonic near-field ablation induced by ultraviolet femtosecond laser pulses
Fabrication of 50-nm period gratings on GaN in air through plasmonic near-field ablation induced by ultraviolet femtosecond laser pulses
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DOI：
10.1364/oe.24.004648
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发表时间：
2016-03-07
期刊：
影响因子：
3.8
通讯作者：
Miyazaki, Kenzo
中科院分区：
文献类型：
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作者：
Miyaji, Godai;Miyazaki, Kenzo
我们在最近开发的两步烧蚀技术中使用 266 nm 紫外飞秒 (fs) 激光脉冲演示了在空气中的 GaN 上形成周期为 50 nm 的均匀纳米光栅。实验结果表明，烧蚀技术成功地控制了目标表面激发的表面等离子体激元（SPP）的空间模式，并根据飞秒激光脉冲的短波长减小了光栅周期。模型目标的计算很好地再现了激光波长相关周期，与观察到的结果非常一致，并支持纳米结构的机制。 (C) 2016年美国光学学会
We demonstrate the formation of a homogeneous nanograting with 50-nm period on GaN in air, using ultraviolet femtosecond (fs) laser pulses at 266 nm in the recently developed two-step ablation technique. The experimental results have shown that the ablation technique successfully controlled the spatial mode of surface plasmon polaritons (SPP) excited on the target surface and decreased the grating period in accordance with the short wavelength of fs laser pulses. Calculation for a model target reproduces well the laser-wavelength dependent periods, being in good agreement with the observed, and supports the mechanism for nanostructuring. (C) 2016 Optical Society of America