Oxidation of Epitaxial Silicene on Ag(111)
Oxidation of Epitaxial Silicene on Ag(111)
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DOI：
10.1002/pssb.201800432
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发表时间：
2019-02-01
影响因子：
1.6
通讯作者：
Vogt，Patrick
中科院分区：
文献类型：
--
作者：
Solonenko，Dmytro;Selyshchev，Oleksandr;Vogt，Patrick
外延硅烯在Ag（111）上的高化学反应性在文献中仍然是一个有争议的主题。特别是外延硅烯的氧化及其相关的寿命在环境条件下的结果有争议的讨论。在这里，报告了通过X射线光电子发射和原位拉曼光谱法研究的外延硅烯层的氧气暴露的详细研究。结果应该清楚地停止关于外延硅烯对氧的稳定性的讨论，因为它在暴露于仅100 L的氧之后变得完全氧化。如此小的剂量为外延硅烯的非原位研究设定了严格的限制。除了氧化硅的形成之外，银衬底表面也氧化，这表明硅烯层几乎不能保护它，这可能是由于硅烯层内的大量域边界。
The high chemical reactivity of epitaxial silicene on Ag(111) still remains a debated subject in the literature. In particular results on the oxidation of epitaxial silicene and its related lifetime under ambient conditions are controversially discussed. Here, a detailed investigation of the oxygen exposure to epitaxial silicene layers investigated by means of X‐ray photoemission and in situ Raman spectroscopy is reported. The results should clearly cease the discussion on the stability of epitaxial silicene against oxygen as it becomes completely oxidized after an exposure to only 100 L of oxygen. Such a small dose sets strict limits for ex situ studies of epitaxial silicene. Besides the formation of silicon oxide also the silver substrate surface oxidizes, suggesting that the silicene layer can hardly protect it, probably owing to the high number of domain boundaries within the silicene layer.