The effects of deposition temperature and post-annealing on the crystal structure and mechanical property of TiCrAlN films with high Al contents

The effects of deposition temperature and post-annealing on the crystal structure and mechanical property of TiCrAlN films with high Al contents
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DOI:
10.1016/j.surfcoat.2005.03.013
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发表时间:
2006-02
影响因子:
5.4
通讯作者:
H. Hasegawa;T. Yamamoto;Tetsuya Suzuki;Kenji Yamamoto
H. Hasegawa;T. Yamamoto;Tetsuya Suzuki;Kenji Yamamoto
中科院分区:
材料科学1区
文献类型:
--
作者:
H. Hasegawa;T. Yamamoto;Tetsuya Suzuki;Kenji Yamamoto

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采用电弧离子镀(AIP)方法在400~650℃温度范围内制备了TixCryAlAlN(x+y+z=1)薄膜。Ti0.1Cr0.2Al0.7和Ti0.25Cr0.1Al0.65靶材分别在580℃和650℃下合成了立方结构的TixCryAlAlN(x+y+z=1)薄膜,薄膜为立方和六方结构的混合相。薄膜由立方相向混合相转变,显微硬度从30 GPa降至24 GPa.C-Ti0.1Cr0.2Al0.7N和c-Ti0.25Cr0.1Al0.65N薄膜的晶粒度约为100 nm,相变后晶粒度约为20-30 nm。研究了后退火对立方结构薄膜相变的影响。结果表明,900℃以上退火后,立方结构薄膜部分转变为六方结构,晶胞参数增大。本文从相变的角度研究和讨论了TixCry阿尔茨N薄膜的力学性能、微观结构和热稳定性随铬含量的变化规律。
TixCryAlzN (x+y+z=1) films were synthesized by the arc ion plating method (AIP) under various deposition temperatures between 400 and 650 °C. The films, synthesized from Ti0.1Cr0.2Al0.7and Ti0.25Cr0.1Al0.65targets, were identified as a cubic type structure below 580 and 650 °C, respectively, over which the films were a mixture phase of cubic and hexagonal type. The microhardness of these films decreased from 30 GPa to 24 GPa corresponding with the phase transition from the cubic to the mixture phase. The grains size of c-Ti0.1Cr0.2Al0.7N and c-Ti0.25Cr0.1Al0.65N films were approximately 100 nm and changed to 20–30 nm after the phase transitions. The effect of post-annealing on the phase transition was investigated for the films with the cubic structure. The result showed that the cubic-type films partially transformed to hexagonal structure by annealing over 900 °C, which led to increase in lattice parameter. In this paper, mechanical properties, microstructure and thermal stability of TixCryAlzN films as a function of Cr contents were investigated and discussed on phase transitions.