XPS study of reactively sputtered Ti-B-N hard coatings
XPS study of reactively sputtered Ti-B-N hard coatings
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DOI：
10.1002/1096-9918(200012)29:12
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发表时间：
2000-12
影响因子：
1.7
通讯作者：
C. Ruby;R. Ott;F. Huang;M. Weaver;J. Barnard
中科院分区：
文献类型：
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作者：
C. Ruby;R. Ott;F. Huang;M. Weaver;J. Barnard
在不同的Ar+N2混合气体中，用直流磁控溅射法从TiB 2靶上制备了Ti-B-N薄膜（500 nm）。薄膜中氮的原子浓度在0和38原子%之间变化。薄膜中硼与钛的比例由TiB 2溅射靶中这两种元素的相对浓度确定。在B 1 s和Ti 2 p谱中观察到B-N、B-Ti、Ti-N和Ti-B键。在N 1 s光谱中观察到的形状的变化导致的结论是，在低氮浓度的氮原子优先与钛原子键合，在很好的协议与natural数据。利用B 1 s、Ti 2 p和N 1 s曲线拟合的定量信息，讨论了TiN、BN和TiB 2三相薄膜的形成。版权所有© 2000约翰威利父子有限公司。
Thin films (500 nm) of Ti–B–N have been produced by d.c. magnetron sputtering from a TiB2 target in various Ar+N2 gas mixtures. The atomic concentration of nitrogen in the films varies between 0 and 38 at.%. The ratio of boron to titanium in the films is fixed by the relative concentration of these two elements in the TiB2 sputtering target. Bonds of B–N, B–Ti, Ti–N and Ti–B are observed in the B 1s and the Ti 2p spectra. The change of shape observed in the N 1s spectra led to the conclusion that at low nitrogen concentration the nitrogen atoms are preferentially bonded with titanium atoms, in good agreement with thermodynamical data. By using quantitative information from the B 1s, Ti 2p and N 1s curve fittings, the formation of a film containing three separate phases (TiN, BN and TiB2) is discussed. Copyright © 2000 John Wiley & Sons, Ltd.