"Force-feedback" leveling of massively parallel arrays in polymer pen lithography.
"Force-feedback" leveling of massively parallel arrays in polymer pen lithography.
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DOI：
10.1021/nl904200t
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发表时间：
2010-04-14
期刊：
影响因子：
10.8
通讯作者：
Mirkin CA
中科院分区：
文献类型：
--
作者：
Liao X;Braunschweig AB;Mirkin CA
聚合物笔式光刻（PPL）是一种新发展起来的分子印刷技术，它可以使用大规模并行（>107支笔）的锥形弹性笔阵列在一个单一的写入步骤中产生直径从80 nm到>10 μm的特征。相对于表面调平这些笔阵列以在大面积上产生均匀特征仍然是相当大的挑战。在这里，我们描述了一种用于调平笔阵列的新方法，该方法利用笔阵列与表面之间的力来实现具有小于0.004°的倾斜的调平，从而产生在1cm上仅变化50nm的特征。
Polymer pen lithography (PPL) is a recently developed molecular printing technique which can produce features with diameters ranging from 80 nm to >10 μm in a single writing step using massively parallel (>107 pens) arrays of pyramidal, elastomeric pens. Leveling these pen arrays with respect to the surface to produce uniform features over large areas remains a considerable challenge. Here, we describe a new method for leveling the pen arrays that utilizes the force between the pen arrays and the surface to achieve leveling with a tilt of less than 0.004°, thereby producing features that vary by only 50 nm over 1 cm.