Controlling preferential growth of chromium – Nitrogen R-HiPIMS and R-DCMS films by substrate magnetic biasing
Controlling preferential growth of chromium – Nitrogen R-HiPIMS and R-DCMS films by substrate magnetic biasing
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DOI：
10.1016/j.apsusc.2021.151113
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发表时间：
2021-12
影响因子：
6.7
通讯作者：
S. Vargas;D. S. Galeano-Osorio;C. Castano
中科院分区：
文献类型：
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作者：
S. Vargas;D. S. Galeano-Osorio;C. Castano
研究了磁偏置对反应磁控溅射沉积在硅衬底上的Cr-N涂层结构的影响。偏磁装置由靠近衬底支架放置的永磁体组成，以改变等离子体的物种动力学和沉积通量。比较了无功直流磁控溅射（R-DCMS）和无功高功率脉冲磁控溅射（R-HiPIMS）的三种磁场配置。通过六种R-DCMS/ hipims -磁场组合，沉积时间、枪功率、衬底距离、温度、气体压力和气体成分等沉积参数保持不变。通过光学发射光谱（OES）监测过程，并与目标/衬底处的电压和电流曲线进行密切比较。提出了一种激发机制，用于解释OES检测到的增强电离及其对薄膜生长的影响。表征了薄膜的化学计量、结构、厚度、形貌和晶体结构，并将其与工艺参数联系起来。R-DCMS过程生成Cr-N固溶体膜，而R-HiPIMS等离子体反应性的增强使N含量增加，形成CrN。总体而言，R-DCMS沉积的样品比R-HiPIMS沉积的样品更厚，但不同的磁场偏置设置允许对薄膜的厚度，质地和微观结构进行特定的控制。
The effect of magnetic biasing on the structure of Cr-N coatings deposited on silicon substrates by reactive magnetron sputtering has been investigated. The magnetic biasing setup consisted of a permanent magnet placed close to the substrate holder to modify the plasma species dynamics and deposition flux. Three magnetic field configurations for reactive direct current magnetron sputtering (R-DCMS) and reactive High Power Impulse Magnetron Sputtering (R-HiPIMS) were compared. Deposition parameters such as deposition time, gun power, substrate distance, temperature, gas pressure, and gas composition were constant through the six R-DCMS/HiPIMS-magnetic-field combinations. Processes were monitored through optical emission spectroscopy (OES) and closely compared to the voltage and current curves at the target/substrate. An excitation mechanism was proposed accounting for the enhanced ionization detected by OES and the implications in the film’s growth. The films’ stoichiometry, structure, thickness, morphology, and crystal texture were characterized and associated with the process parameters. The R-DCMS processes led to Cr-N solid solution films, while the enhanced reactivity of R-HiPIMS plasma species increased the N content and formed CrN. Overall, the R-DCMS deposited samples were thicker than the R-HiPIMS deposited samples, but the different magnetic field biasing setups allowed for specific control of films’ thickness, texture, and microstructure.