Nano‐slit probes for near‐field optical microscopy fabricated by focused ion beams

Nano‐slit probes for near‐field optical microscopy fabricated by focused ion beams
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由聚焦离子束制造的用于近场光学显微镜的纳米狭缝探针

DOI:
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发表时间:
1999
影响因子:
2
通讯作者:
L. Frey
L. Frey
中科院分区:
工程技术4区
文献类型:
--
作者:
H. Danzebrink;T. Dziomba;T. Sulzbach;O. Ohlsson;C. Lehrer;L. Frey

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本文描述的近场探针基于由硅制成的金属化非接触式原子力显微镜悬臂。对于高分辨率近场光学/红外显微镜的应用,我们使用孔径探针,其孔径由聚焦离子束制造。这项技术使我们能够创建具有不同几何形状的亚波长尺寸的孔径。在本文中,我们介绍了狭缝形孔径的使用,该孔径显示出偏振相关的传输效率和在 1064nm 波长下 <100nm 的横向分辨率。作为表征近场探针的测试样本,我们研究了以恒定高度模式沉积在硅晶片上超薄铬子层上的金/钯结构。
The near‐field probes described in this paper are based on metallized non‐contact atomic force microscope cantilevers made of silicon. For application in high‐resolution near‐field optical/infrared microscopy, we use aperture probes with the aperture being fabricated by focused ion beams. This technique allows us to create apertures of sub‐wavelength dimensions with different geometries. In this paper we present the use of slit‐shaped apertures which show a polarization‐dependent transmission efficiency and a lateral resolution of < 100 nm at a wavelength of 1064 nm. As a test sample to characterize the near‐field probes we investigated gold/palladium structures, deposited on an ultrathin chromium sublayer on a silicon wafer, in constant‐height mode.