Site and morphology controlled ZnO deposition on Pd catalyst prepared from Pd/PMMA thin film using UV lithography
Site and morphology controlled ZnO deposition on Pd catalyst prepared from Pd/PMMA thin film using UV lithography
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DOI：
10.1021/cm0506555
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发表时间：
2005-09
影响因子：
8.6
通讯作者：
Jaeyoung Lee;D. Yin;S. Horiuchi
中科院分区：
文献类型：
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作者：
Jaeyoung Lee;D. Yin;S. Horiuchi
在温和的条件下，通过无电沉积工艺，在纳米钯（Pd）催化剂上原位选择性地生长了轮廓分明的氧化锌（ZnO）。Pd催化剂的纳米粒子的形式，主要定位在聚甲基丙烯酸甲酯（PMMA）薄膜的紫外线照射的表面上，通过减少蒸发的钯（II）双（乙酰丙酮）表示为Pd（acac）2在我们的干燥过程。Pd纳米粒子的催化活性受PMMA膜厚度、紫外光照射剂量和Pd（acac）2暴露时间的影响，其最佳值为约100 nm。20 nm、20 J/cm 2和5 min。ZnO的图案精度和结晶形态的变化敏感地依赖于Pd颗粒的尺寸和沉积温度，其中前者导致更胖的晶体，而后者抑制横向生长，得到更长的六方纳米棒。
Well-defined line patterns of zinc oxide (ZnO) were site-selectively grown on the photopatterned palladium (Pd) catalysts through an electroless deposition process under mild conditions. Pd catalysts in the form of nanoparticles were mainly positioned on the UV irradiated surface of polymethyl methacrylate (PMMA) film via the reduction of vaporized palladium(II) bis(acetylacetonato) denoted as Pd(acac)2 in our drying process. The catalytic activity of the Pd nanoparticles was affected by the PMMA film thickness, the UV dose, and the exposure time to Pd(acac)2, whose optimum values were ca. 20 nm, 20 J/cm2, and 5 min, respectively. The ZnO pattern accuracy and the crystalline morphology were varied sensitively depending on the Pd particle size and deposition temperature, in which the former caused the fatter crystals, while the latter suppressed the lateral growth, giving the longer hexagonal nanorods.