Preparation of TiO2 thin films on the inner surface of a quartz tube using atmospheric-pressure microplasma
Preparation of TiO2 thin films on the inner surface of a quartz tube using atmospheric-pressure microplasma
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DOI：
10.1116/1.2891251
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发表时间：
2008-03
期刊：
影响因子：
--
通讯作者：
H. Yoshiki;Taku Saito
中科院分区：
文献类型：
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作者：
H. Yoshiki;Taku Saito
采用等离子体增强化学气相沉积法，以四异丙醇钛和氧气为反应物，氦气为载气，在内径分别为1 mm和3 mm的石英管内壁上制备了TiO2薄膜。微等离子体产生的管内射频（13.56MHz）激励使用外部连接的平行板电极。通过扫描电子显微镜、X射线光电子能谱和X射线衍射研究了沉积膜的特性。典型的沉积膜具有光滑表面的非晶结构，并且是透明的。随着等离子体气相中O2浓度的增加，沉积的薄膜表面被大量的TiO2纳米颗粒覆盖。然而，沉积的薄膜是TiO2和无定形碳的混合物，并在源气体中没有O2的情况下显示出粗糙的表面。在内径为1mm、外径为3mm的石英管内壁上制备了TiO2薄膜，并利用光发射光谱仪对等离子体中产生的气体成分进行了分析，讨论了等离子体中O2浓度对TiO2薄膜特性的影响，使用等离子体增强的化学气相沉积，在大气压下用四异丙醇钛和氧气（O2）作为反应物，用氦气作为载气。微等离子体产生的管内射频（13.56MHz）激励使用外部连接的平行板电极。通过扫描电子显微镜、X射线光电子能谱和X射线衍射研究了沉积膜的特性。典型的沉积膜具有非晶结构，表面光滑且透明。随着等离子体气相中O2浓度的增加，沉积的薄膜表面被大量的TiO2纳米颗粒覆盖。然而，沉积的薄膜是TiO2和无定形碳的混合物，并在源气体中没有O2的情况下显示出粗糙的表面。研究了等离子体气体中O2浓度对等离子体放电的影响。
Titanium dioxide (TiO2) thin films were prepared on the inner surface of a quartz tube, with inner and outer diameters of 1 and 3mm, respectively, using plasma-enhanced chemical vapor deposition with titanium tetraisopropoxide and oxygen (O2) as reactants and helium as the carrier gas at atmospheric pressure. A microplasma was generated inside the tube by rf (13.56MHz) excitation using externally attached parallel-plate electrodes. The characteristics of the deposited films were examined by scanning electron microscopy, x-ray photoelectron spectroscopy, and x-ray diffraction. A typical as-deposited film had an amorphous structure with a smooth surface and was transparent. With increasing O2 concentration in the plasma gas phase, the deposited film surface was covered with a large number of TiO2 nanoparticles. However, the deposited films were a mixture of TiO2 and amorphous carbon and showed rough surface in the absence of O2 in the source gas. The effects of the O2 concentration in the plasma gas on the characteristics of the deposited TiO2 films are discussed on the basis of the analysis of the gas species generated in the plasma using optical emission spectroscopy.Titanium dioxide (TiO2) thin films were prepared on the inner surface of a quartz tube, with inner and outer diameters of 1 and 3mm, respectively, using plasma-enhanced chemical vapor deposition with titanium tetraisopropoxide and oxygen (O2) as reactants and helium as the carrier gas at atmospheric pressure. A microplasma was generated inside the tube by rf (13.56MHz) excitation using externally attached parallel-plate electrodes. The characteristics of the deposited films were examined by scanning electron microscopy, x-ray photoelectron spectroscopy, and x-ray diffraction. A typical as-deposited film had an amorphous structure with a smooth surface and was transparent. With increasing O2 concentration in the plasma gas phase, the deposited film surface was covered with a large number of TiO2 nanoparticles. However, the deposited films were a mixture of TiO2 and amorphous carbon and showed rough surface in the absence of O2 in the source gas. The effects of the O2 concentration in the plasma gas on the ...