Nano-etching Using Nanodots Mask Fabricated by Bio-nano-process
Nano-etching Using Nanodots Mask Fabricated by Bio-nano-process
复制标题
使用生物纳米工艺制造的纳米点掩模进行纳米蚀刻
DOI：
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发表时间：
2003
期刊：
影响因子：
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通讯作者：
I. Yamashita
中科院分区：
文献类型：
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作者：
G. Yamazaki;Y. Uraoka;T. Fuyuki;I. Yamashita
直径为 6 nm 的氧化铁纳米点阵列被用作电感耦合等离子体 (ICP) 蚀刻工艺的纳米尺寸图案掩模。纳米点阵列是通过称为生物纳米工艺的生物途径制造的。采用笼蛋白铁蛋白来容纳直径为 6 nm 的氧化铁核心，并利用其自组装能力制成铁蛋白的二维阵列。将铁蛋白阵列转移到硅片上，并通过臭氧处理选择性地消除蛋白质部分。纳米点阵列用作图案化干蚀刻掩模。在低温下使用 CHF3 气体进行 ICP 蚀刻产生了锥形峰和平台的组合。这一结果表明，通过生物纳米工艺生产的氧化铁纳米点阵列可以用作干法刻蚀掩模，并且可以生产高密度的纳米柱阵列。考虑到多种可以容纳无机材料的生物分子，这种生物纳米工艺有望为制造纳米级掩模带来新的方法。
An array of iron oxide nanodots with 6 nm diameter was used as a nanometer size patterning mask for inductively coupled plasma (ICP) etching process. The array of nanodots was fabricated by biological pathway named bio-nano-process. A cage protein, ferritin, was employed to accommodate an iron oxide core with 6 nm diameter and a two dimensional array of ferritin was made using their self-assembling ability. The array of ferritin was transferred onto a silicon wafer and the protein moiety was selectively eliminated by ozone treatment. The array of nanodots was used as a patterning dry-etching mask. The ICP etching using CHF3 gas at low temperature produced a combination of cone-shape peaks and plateaux. This result demonstrates the possibility that iron oxide nanodots array produced by bio-nano-process can be used as a dry-etching mask and that an array of nano-columns with high density could be produced. Taking a variety of bio-molecules which can accommodate inorganic materials into consideration, this bio-nano-process is expected to lead to a new approach for making nano-scale masks.
介导镓 67 从乳铁蛋白转移到铁蛋白的化合物。
DOI：
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发表时间：
1985
期刊：
Journal of nuclear medicine : official publication, Society of Nuclear Medicine
影响因子：
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作者：
Weiner,RE;Schreiber,GJ;Hoffer,PB;Bushberg,JT
通讯作者：
Bushberg,JT