The effect of substrate on the spray-deposited TiO_2 nanostructured films for dye-sensitized cells
The effect of substrate on the spray-deposited TiO_2 nanostructured films for dye-sensitized cells
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基质对喷雾沉积TiO_2纳米结构薄膜用于染料敏化细胞的影响
DOI：
10.1166/jnn.2011.3596
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发表时间：
2011
期刊：
影响因子：
--
通讯作者：
T.Takahashi
中科院分区：
文献类型：
--
作者：
M.F.Hossain;T.Takahashi
在200-500 °C的不同衬底温度下，采用喷雾热解技术在SnO 2：F（FTO）涂层玻璃衬底上沉积了纳米结构的TiO 2薄膜。TiO 2薄膜的结构、表面形貌和光学性质随衬底温度的变化而显著变化。在400 °C下沉积的TiO 2膜的表面显示出纳米片和短纳米棒（约130 nm）状结构，而在500 °C下制备的TiO 2膜仅显示出纳米片状结构。在较高温度（300-500 °C）下制备的TiO 2薄膜的带隙由于其晶体结构中存在金红石相而变窄。钌（II）配合物作为染料，KI/I2作为电解质，FTO玻璃上的碳作为对电极，已用于制造染料敏化太阳能电池（DSC）。在400 °C下沉积的TiO 2薄膜在DSC中表现出最好的光伏性能，其效率为3.81%，光电压为773 mV，光电流为8.34 mA/cm 2，填充因子为56.17%。DSC的光电压随着沉积过程中衬底温度的升高而增加。此外，所有DSC都表现出相当高的填充因子值。
The nanostructured TiO2 films have deposited on SnO2:F (FTO) coated glass substrate by spray pyrolysis technique at different substrate temperatures of 200–500 °C. The structural, surface morphological and optical properties of TiO2 films significantly vary with the substrate temperature. The surface of the TiO2 films deposited at 400 °C shows the nanoflakes and short nanorods (∼130 nm) like structures while the TiO2 films prepared at 500 °C shows only the nanoflakes like structures. The band gap of the TiO2 films prepared at higher temperatures (300–500 °C) becomes narrow due to presence the rutile phases in their crystal structure. Ruthenium (II) complex as a dye, KI/I2 as an electrolyte and carbon on FTO glass as a counter electrode has used to fabricate the dye-sensitized solar cell (DSC). The TiO2 film deposited at 400 °C has showed the best photovoltaic performance in DSC with the efficiency of 3.81%, the photovoltage of 773 mV, the photocurrent of 8.34 mA/cm2, and the fill factor of 56.17%. The photovoltage of the DSC increases with the increase of substrate temperature during the deposition of TiO2 films. Moreover, all the DSCs exhibit reasonably high fill factor value.